Hi all,
I work for a company near Boston that makes Ion Implant machines for use in the Semiconductor Industry.
The SIC wafer implants differ from Silicon wafer implants in a big way. One major difference is with SIC, the wafers are heated up to between 450 to 700 degrees Celsius prior to ion implant, whereas with Silicon, the wafers are usually cooled to be at 25 Celsius or less.
I attach a photo taken from that linked video. There is some neat video showing the ion implant process.
https://youtu.be/z4CR9d5QQIUJim
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